Rui Yu, Kang He, Qi Liu, Xucheng Gan, Bingfeng Miao, Liang Sun, Jun Du, Hongling Cai, Xiaoshan Wu, Mingzhong Wu, and Haifeng Ding
Adv. Electron. Mater 5, 1800663(2019)
DOI: 10.1002/aelm.201800663